Strategic Objectives
• Master the principles of directed self-assembly to surpass optical limits.
• Understand the thermodynamics of phase separation for precision patterning.
• Bridge the gap between chemical bottom-up synthesis and top-down lithography.
• Implement scalable nanomanufacturing techniques for 2nm nodes and beyond.
The Core Challenge
As semiconductor features shrink toward the atomic scale, conventional top-down manufacturing faces physical and economic barriers that threaten the future of Moore's Law.
01
The Dawn of Hybrid Lithography
02
Polymer Physics Foundations
03
The Mechanics of Block Copolymers
04
Thermodynamics of Phase Separation
05
The Flory-Huggins Theory
06
Microphase Separation Transitions
07
Self-Assembly Dynamics
08
Directed Self-Assembly (DSA)
09
Graphoepitaxy Techniques
10
Chemical Epitaxy
11
Annealing and Kinetics
12
Solvent Vapor Treatment
13
Plasma Etching for Pattern Transfer
14
Metrology at the Nanoscale
15
Defectivity and Yield
16
Advanced Pattern Multiplication
17
Materials for 2nm Nodes
18
Interfacial Engineering
19
Computational Lithography
20
Industrial Integration
21