Strategic Objectives
• Master the thermodynamics of block copolymer phase separation.
• Achieve sub-10nm pitch multiplication without extreme UV tools.
• Implement co-optimization strategies for high-volume manufacturing.
• Navigate the transition from top-down to bottom-up fabrication.
The Core Challenge
As semiconductor features shrink toward the atomic scale, top-down optical tools are becoming prohibitively expensive and physically limited.
01
The Paradigm Shift
02
The Physics of Polymers
03
Block Copolymer Fundamentals
04
The Thermodynamics of Order
05
Flory-Huggins Theory
06
Pitch Multiplication Mechanics
07
Graphoepitaxy Techniques
08
Chemoepitaxy Strategies
09
Surface Energy Engineering
10
The Role of Annealing
11
Solvent Vapor Annealing
12
Metrology for the Nanoscale
13
Defectivity and Line Edge Roughness
14
Etch Selectivity in Polymers
15
The Co-Optimization Workflow
16
Computational Lithography
17
Next-Generation Materials
18
Hybrid Lithography Systems
19
Industrial Integration
20
Sustainability and Economics
21