Strategic Objectives
• Master the mechanics of Extreme Ultraviolet (EUV) light source generation.
• Understand the chemical precision of Directed Self-Assembly (DSA).
• Navigate the technical hurdles of Electron Beam and Nanoimprint lithography.
• Bridge the gap between theoretical physics and high-volume semiconductor manufacturing.
The Core Challenge
As Moore’s Law hits physical limits, traditional manufacturing fails to produce the sub-10nm structures required for next-generation tech.
01
The Physics of Scale
02
The Limits of Light
03
EUV Physics
04
Plasma Light Sources
05
Reflective Optics
06
Electron Beam Fundamentals
07
The Chemistry of Resists
08
Nanoimprint Lithography
09
Directed Self-Assembly
10
Proximity Effects
11
Atomic Layer Etching
12
Mask Technology
13
Stochastic Effects
14
Scanning Probe Lithography
15
Interferometric Lithography
16
Metrology and Inspection
17
Multi-Patterning Strategies
18
Soft Lithography
19
Surface Chemistry and Functionalization
20
Computational Lithography
21
The Road to 1nm
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